DOI: 10.5176/2251-1857_M363
Authors: Amir Pakdel, Chunyi Zhi, Kentaro Watanabe, Takashi Sekiguchi, Tomonobu Nakayama and Dmitri Golberg
Abstract:
A chemical vapor deposition approach was utilized to obtain transparent superhydrophobic boron nitride (BN) films on silicon/ silicon dioxide substrates. Scanning electron microscopy observations revealed that the films were consisting of partially vertically aligned nanosheets and transmission electron microscopy measurements confirmed that the majority of them were less than 5 nm thick. Fourier transform infrared spectroscopy and X-ray photoelectron spectroscopy determined the dominance of B–N bonding state in the films, and electron energy loss spectroscopy and Raman spectroscopy further verified the purity of the BN nanosheets. Ultraviolet-visible spectroscopy demonstrated a wide optical band gap of ~5.6 eV in BN nanosheets and cathodoluminescence spectroscopy results showed a strong luminescence emission in the ultraviolet region.
Keywords:
boron nitride nanosheet; superhydrophobicity; band gap; cathodoluminescence emission
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