DOI: 10.5176/2251-1857_M318.6
Authors: Yao-Ching Chiu, Zhi-Lin Hu, Hsiang-Chen Wang, Chie-Tong Kuo, Ping-Han Wu, Chun-Ping Jen and Shih-Wei Feng
Abstract: Femtosecond laser has the advantage of rapid processing time and smaller heat-affected zone compared to traditional long pulse laser. Using femtosecond laser on ITO substrate, we can change characteristics of materials through the annealing process Since Laser annealing is more selective than High temperature annealing, applying the method on multiplelayer elements can anneal specific area and avoid excessively heat-damaging other area. High-temperature annealing requires repeated testing using SEM and XRD in order to establish material parameter database. We established a pump-probe system to real-time monitor the annealing process of ITO substrate using femtosecond lasere. We applied pump beam as the annealing source, and used probe beam to monitor the change of ITO transmittance.
Keywords: ITO, Femtosecond laser, Annealing
Updating...